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| Published: June 30, 2024

Workplace Ostracism, Employee Silence and Organisational Commitment among Private Sector Tech Employees

Angel Jaison

MSc. Psychology, Dept. of Psychology, Kristu Jayanti College. Affiliated to Bengaluru North University, Bengaluru. Google Scholar More about the auther

, Anitha Mary Mathew

Assistant professor, Dept. of Psychology, Kristu Jayanti College, Affiliated to Bengaluru North University, Bengaluru, India Google Scholar More about the auther

DIP: 18.01.366.20241202

DOI: 10.25215/1202.366

ABSTRACT

In the dynamic landscape of the technology sector, workplace dynamics such as ostracism, employee silence, and organizational commitment play pivotal roles in shaping organizational culture and employee well-being. This research explores these dynamics among private sector tech employees in Kerala and Bangalore, India. The study investigates the relationships between workplace ostracism, employee silence, and organizational commitment, considering gender differences. A correlational research design with purposive sampling was employed, and data were collected using validated scales. Results reveal a significant positive correlation between workplace ostracism and employee silence, as well as organizational commitment. Surprisingly, no significant gender differences were found in these dynamics. These findings underscore the importance of addressing workplace ostracism and fostering inclusive environments to mitigate employee silence and enhance organizational commitment. Practical implications include prioritizing inclusivity in organizational culture, providing leadership training, and implementing continuous monitoring strategies. However, limitations such as regional and sample size constraints warrant cautious interpretation of the results. This research contributes to understanding workplace dynamics in the tech sector and informs strategies for fostering positive organizational cultures and enhancing employee engagement.

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Angel Jaison @ angeljaison444@gmail.com

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Article Overview

ISSN 2348-5396

ISSN 2349-3429

18.01.366.20241202

10.25215/1202.366

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Published in   Volume 12, Issue 2, April-June, 2024